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Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition.

Bibliographic Details
Title: Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition.
Authors: Chhowalla, M., Teo, K. B. K., Ducati, C.
Source: Journal of Applied Physics; November 15 2001, Vol. 90 Issue 10, p5308-5317, 10p
Database: Applied Science & Technology Source
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DbLabel: Applied Science & Technology Source
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PubType: Academic Journal
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  Data: Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition.
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    Identifiers:
      – Type: doi
        Value: 10.1063/1.1410322
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      – Code: eng
        Text: English
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        PageCount: 10
        StartPage: 5308
    Titles:
      – TitleFull: Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition.
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            NameFull: Chhowalla, M.
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            NameFull: Teo, K. B. K.
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            NameFull: Ducati, C.
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            – D: 15
              M: 11
              Text: November 15 2001
              Type: published
              Y: 2001
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              Value: 00218979
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              Value: 90
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              Value: 10
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            – TitleFull: Journal of Applied Physics
              Type: main
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