Chhowalla, M., Teo, K. B. K., & Ducati, C. (2001). Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition. Journal of Applied Physics, 90(10), 5308-5317. https://doi.org/10.1063/1.1410322

Chhowalla, M., K. B. K. Teo, and C. Ducati. "Growth Process Conditions of Vertically Aligned Carbon Nanotubes Using Plasma Enhanced Chemical Vapor Deposition." Journal of Applied Physics 90, no. 10 (2001): 5308-5317. https://doi.org/10.1063/1.1410322.

Chhowalla, M., et al. "Growth Process Conditions of Vertically Aligned Carbon Nanotubes Using Plasma Enhanced Chemical Vapor Deposition." Journal of Applied Physics, vol. 90, no. 10, 2001, pp. 5308-5317, https://doi.org/10.1063/1.1410322.