One Nanometer HfO2‐Based Ferroelectric Tunnel Junctions on Silicon (Adv. Electron. Mater. 6/2022)

Bibliographic Details
Title: One Nanometer HfO2‐Based Ferroelectric Tunnel Junctions on Silicon (Adv. Electron. Mater. 6/2022)
Authors: Cheema, Suraj S., Shanker, Nirmaan, Hsu, Cheng‐Hsiang, Datar, Adhiraj, Bae, Jongho, Kwon, Daewoong, Salahuddin, Sayeef
Source: Advanced Electronic Materials. 8(6)
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Database: British Library Document Supply Centre Inside Serials & Conference Proceedings
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ISSN:2199160X
Published in:Advanced Electronic Materials
Language:English