Magnetoresistive element and method for manufacturing the same
| Title: | Magnetoresistive element and method for manufacturing the same |
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| Patent Number: | 9,368,717 |
| Publication Date: | June 14, 2016 |
| Appl. No: | 14/200742 |
| Application Filed: | March 07, 2014 |
| Abstract: | According to one embodiment, a magnetoresistive element is disclosed. The magnetoresistive element includes a reference layer. The reference layer includes a first region, and a second region provided outside the first region to surround the same. The second region contains an element contained in the first region and another element being different from the element. The magnetoresistive element further includes a storage layer, and a tunnel barrier layer provided between the reference layer and the storage layer. The storage layer is free from the another element. |
| Inventors: | Toko, Masaru (Seoul, KR); Nakayama, Masahiko (Seoul, KR); Sugiura, Kuniaki (Seoul, KR); Hashimoto, Yutaka (Seoul, KR); Kai, Tadashi (Seoul, KR); Murayama, Akiyuki (Seoul, KR); Kishi, Tatsuya (Seoul, KR) |
| Assignees: | KABUSHIKI KAISHA TOSHIBA (Tokyo, JP) |
| Claim: | 1. A magnetoresistive element, comprising: a reference layer comprising a first region, and a second region provided outside the first region to surround the first region, the second region containing an element contained in the first region and another element different from the element, wherein the another element is at least one element selected from the group consisting of As, Ge, Ga, Sb, In, N, Ar, He, O, Si, B, C, Zr, Tb, S, Se, P, and Ti; a storage layer which is free of the another element; and a tunnel barrier layer provided between the reference layer and the storage layer, wherein a width of the tunnel barrier layer and a width of the storage layer are larger than a width of the reference layer. |
| Claim: | 2. The element according to claim 1 , further comprising: a shift cancelling layer provided on the reference layer, wherein the shift cancelling layer comprises a third region which is free of the another element, and a fourth region provided outside the third region to surround the third region, wherein the fourth region contains an element contained in the third region and the another element. |
| Claim: | 3. The element according to claim 2 , further comprising: a cap layer provided on the shift cancelling layer. |
| Claim: | 4. A magnetoresistive element, comprising: a reference layer comprising a first region, and a second region provided outside the first region to surround the first region, the second region containing an element contained in the first region and another element different from the element, wherein the another element is at least one element selected from the group consisting of As, Ge, Ga, Sb, In, N, Ar, He, O, Si, B, C, Zr, Tb, S, Se, P, and Ti; a storage layer which is free of the another element; and a tunnel barrier layer provided between the reference layer and the storage layer, wherein a width of the tunnel barrier layer is approximately equal to a width of the storage layer. |
| Claim: | 5. The element according to claim 2 , wherein a width of the shift cancelling layer is approximately equal to the width of the reference layer. |
| Claim: | 6. The element according to claim 2 , further comprising: an insulating sidewall covering side walls of the reference layer and the shift cancelling layer. |
| Claim: | 7. The element according to claim 1 , wherein the second region is demagnetized. |
| Claim: | 8. The element according to claim 2 , wherein the fourth region is demagnetized. |
| Claim: | 9. A magnetoresistive element, comprising: a shift cancelling layer comprising a first region, and a second region provided outside the first region to surround the first region, the second region containing an element contained in the first region and another element different from the element; a reference layer provided on the shift cancelling layer, wherein the reference layer is free of the another element; a tunnel barrier layer provided on the reference layer; and a storage layer provided on the tunnel barrier layer, wherein the storage layer is free of the another element. |
| Claim: | 10. The element according to claim 9 , wherein the another element is at least one element selected from the group consisting of As, Ge, Ga, Sb, In, N, Ar, He, F, Cl, Br, I, O, Si, B, C, Zr, Tb, S, Se, P, and Ti. |
| Claim: | 11. The element according to claim 10 , wherein the second region is demagnetized. |
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| Primary Examiner: | Prenty, Mark |
| Attorney, Agent or Firm: | Holtz, Holtz & Volek PC |
| Accession Number: | edspgr.09368717 |
| Database: | USPTO Patent Grants |
| Language: | English |
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