Heat-sensitive positive-working lithographic printing plate precursor
| Title: | Heat-sensitive positive-working lithographic printing plate precursor |
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| Patent Number: | 8,110,338 |
| Publication Date: | February 07, 2012 |
| Appl. No: | 12/280597 |
| Application Filed: | February 20, 2007 |
| Abstract: | A heat-sensitive positive-working lithographic printing plate precursor includes a support having a hydrophilic surface or which is provided with a hydrophilic layer, a heat-sensitive coating including an IR absorbing agent, a phenolic resin, and a first polymer, wherein the first polymer is an alkaline soluble polymer including a monomeric unit having a structure according to Formula I or Formula II, wherein at least one of the aromatic groups Ar1 and Ar2 is an optionally substituted heteroaromatic group: [chemical expression included] |
| Inventors: | Loccufier, Johan (Zwijnaarde, BE); Lingier, Stefaan (Assenede, BE); Van Aert, Hubertus (Pulderbos, BE); Venneman, Jan (Berchem, BE); Van Damme, Marc (Bonheiden, BE) |
| Assignees: | Agfa Graphics NV (Mortsel, BE) |
| Claim: | 1. A heat-sensitive positive-working lithographic printing plate precursor comprising: a support having a hydrophilic surface or which is provided with a hydrophilic layer; a heat-sensitive coating including an IR absorbing agent, a phenolic resin, and a first polymer; wherein the first polymer is an alkaline soluble polymer including a monomeric unit having a structure according to Formula I or Formula II: [chemical expression included] wherein: * denotes binding sites of the monomeric unit in the polymer backbone; R 1 is hydrogen or an alkyl group; Z represents oxygen or —NR 2 —; a and b independently are 0 or 1; R 2 is hydrogen or an optionally substituted alkyl, alkenyl, or alkynyl group; and Ar 1 and Ar 2 are an aromatic group with the proviso that at least one of Ar 1 and Ar 2 is an optionally substituted heteroaromatic group. |
| Claim: | 2. A precursor according to claim 1 , wherein the Ar 2 is an optionally substituted heteroaromatic group. |
| Claim: | 3. A precursor according to claim 1 , wherein the monomeric unit has a structure according to Formula I. |
| Claim: | 4. A precursor according to claim 1 , wherein the optionally substituted heteroaromatic group includes at least one nitrogen atom in the aromatic ring. |
| Claim: | 5. A precursor according to claim 1 , wherein the optionally substituted heteroaromatic group is selected from the group consisting of an optionally substituted furan, thiophene, pyrrole, pyrazole, imidazole, 1,2,3-triazole, 1,2,4-triazole, tetrazole, oxazole, isoxazole, thiazole, isothiazole, thiadiazole, oxadiazole, pyridine, pyridazine, pyrimidine, pyrazine, 1,3,5-triazine, 1,2,4-triazine or 1,2,3-triazine, benzofuran, benzothiophene, indole, indazole, benzoxazole, quinoline, quinazoline, benzimidazole, and benztriazole. |
| Claim: | 6. A precursor according to claim 1 , wherein the first polymer further includes other monomeric units selected from the group consisting of an optionally N-substituted (meth)acryl amide monomeric unit, an optionally N-substituted maleimide monomeric unit, an ester of a (meth)acrylic acid, polyoxyethylene (meth)acrylic acid ester, 2-hydroxy ethyl (meth)acrylate, an optionally substituted styrene, a styrene sulphonic acid, an o-, p- or m-vinyl benzoic acid, an optionally substituted vinyl pyridine, N-vinyl caprolactam, N-vinyl pyrrolidone, (meth)acrylic acid, itaconic acid, maleic acid, glycidyl (meth)acrylate, optionally hydrolysed vinyl acetate, and vinyl phosphonic acid. |
| Claim: | 7. A precursor according to claim 1 , wherein the first polymer includes a monomeric unit having a structure according to Formula I or Formula II, and the monomeric unit of the monomers N-benzyl (meth)acrylamide and (meth)acrylic acid. |
| Claim: | 8. A precursor according to claim 1 , wherein the monomeric unit having a structure according to Formula I or Formula II is present in the first polymer in an amount ranging between 10 mol % and 90 mol %. |
| Claim: | 9. A method for making a lithographic printing plate comprising the steps of: providing a heat-sensitive lithographic printing plate precursor as defined in claim 1 ; image-wise exposing the precursor with IR-radiation or heat; and developing the image-wise exposed precursor. |
| Claim: | 10. A method for improving the chemical resistance of a heat-sensitive coating of a heat-sensitive lithographic printing plate precursor: providing a heat-sensitive lithographic printing plate precursor including a support and a heat-sensitive coating including an alkaline soluble polymer, the alkaline soluble polymer including a monomeric unit having a structure according to Formula I or Formula II: [chemical expression included] wherein: * denotes binding sites of the monomeric unit in the polymer backbone; R 1 is hydrogen or an alkyl group; Z represents oxygen or —NR 2 —; a and b independently are 0 or 1; R 2 is hydrogen or an optionally substituted alkyl, alkenyl, or alkynyl group; and Ar 1 and Ar 2 are an aromatic group with the proviso that at least one of Ar 1 and Ar 2 is an optionally substituted heteroaromatic group. |
| Current U.S. Class: | 4302/711 |
| Patent References Cited: | 5340699 August 1994 Haley et al. 2010/0055610 March 2010 Loccufier et al. 0 864 420 September 1998 0 909 657 April 1999 1 072 432 January 2001 1 120 246 August 2001 1 211 065 June 2002 1 241 003 September 2002 1 262 318 December 2002 1 275 498 January 2003 1 291 172 March 2003 1 338 416 August 2003 1 433 594 June 2004 1 268 660 July 2004 1 439 058 July 2004 1 311 394 December 2004 1 263 590 March 2005 1 011 970 February 2006 1 299 238 February 2007 1 368 413 July 2008 2000-019724 January 2000 01/96119 December 2001 03/074287 September 2003 2004/033206 April 2004 |
| Other References: | Machine translation of JP 2000-019724, published on Jan. 21, 2000. cited by examiner Official Communication issued in International Patent Application No. PCT/EP2007/051612, mailed on May 21, 2007. cited by other |
| Primary Examiner: | Eoff, Anca |
| Attorney, Agent or Firm: | Keating & Bennett, LLP |
| Accession Number: | edspgr.08110338 |
| Database: | USPTO Patent Grants |
| Language: | English |
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