Imprinting device and imprinting method
| Title: | Imprinting device and imprinting method |
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| Patent Number: | 7,857,611 |
| Publication Date: | December 28, 2010 |
| Appl. No: | 12/279481 |
| Application Filed: | February 07, 2007 |
| Abstract: | After a transfer material was hardened in a situation an imprint mold which has a concave part pattern is forced against the liquid transfer material, a replica which has a convex part pattern corresponding to the concave part pattern by releasing the imprint mold. A pressurization mechanism and a vacuum pump are set, regarding depth K of the concave part pattern of the imprint mold, height k of the convex part pattern of the transfer material, effective pressure Mo while the imprint mold is forced, pressure P in the space, with satisfying: Mo/P≧k/(K−k). With this arrangement, even if air comes inside of the concave part pattern of the imprint mold and is stuffed in the inside, it is possible to have transcription with no problem. |
| Inventors: | Hosoda, Yasuo (Saitama, JP); Imai, Tetsuya (Saitama, JP) |
| Assignees: | Pioneer Corporation (Tokyo, JP) |
| Claim: | 1. An imprint apparatus that forms a replica which has a convex part pattern corresponding to a concave part pattern, comprising: a substrate on which a transfer material is put; an imprint mold which has said concave part pattern; a forcing unit which generates forcing power to force said imprint mold against said transfer material on said substrate at a minimum forcing pressure Mmin [Pa] at a contact area between said imprint mold and said transfer material; a pressure adjusting unit which adjusts a pressure of an atmosphere so that a pressure of a space surrounding said imprint mold and said substrate becomes a pressure P [Pa]; and a control unit, wherein said control unit controls said forcing unit and said pressure adjusting unit based on depth K [nm] of said concave part pattern of said imprint mold and height k [nm] of said convex part pattern of said replica, and wherein said control unit controls said forcing unit and said pressure adjusting unit with satisfying: M min/ P≧k /(K−k). |
| Claim: | 2. The imprint apparatus according to claim 1 , wherein: said pressure adjusting unit is a decompression unit. |
| Claim: | 3. The imprint apparatus according to claim 1 , wherein: said control unit controls said forcing unit and said pressure adjusting unit with satisfying: 99≧ M min/ P≧ 9. |
| Claim: | 4. The imprint apparatus according to claim 1 , further comprising: an input unit which inputs depth K [nm] of said concave part pattern, height k [nm] of said convex part pattern. |
| Claim: | 5. The imprint apparatus according to claim 1 , further comprising: a gas replacing unit converts said space into dry environment. |
| Claim: | 6. An imprint apparatus that forms a replica which has a convex part pattern corresponding to a concave part pattern, comprising: a substrate on which a transfer material is put; an imprint mold which has said concave part pattern; a forcing unit which generates forcing power to force said imprint mold against said transfer material on said substrate at a minimum forcing pressure Mmin [Pa] at a contact area between said imprint mold and said transfer material; a pressure adjusting unit which adjusts a pressure of an atmosphere so that a pressure of a space surrounding said imprint mold and said substrate becomes a pressure P [Pa]; and a control unit, wherein said control unit controls said forcing unit and said pressure adjusting unit based on depth K [nm] of said concave part pattern of said imprint mold and height k [nm] of said convex part pattern of said replica, and wherein said control unit controls said forcing unit and said pressure adjusting unit in case height k [nm] of said convex part pattern is less than said depth K, with satisfying: 1.1 k /(K− 1.1 k)≧ M min/ P≧ 0.9 k /(K− 0.9 k). |
| Claim: | 7. An imprint apparatus that forms a replica which has a convex part pattern corresponding to a concave part pattern, said imprint apparatus comprising: a vacuum chamber; a substrate provided within the vacuum chamber, the substrate providing a location for placing a transfer material; an imprint mold having a concave part pattern; a forcing unit which generates a forcing power to force said imprint mold against the transfer material located on said substrate at a minimum forcing pressure Mmin [Pa] at a contact area between said imprint mold (4) and said transfer material (2); and a pressure adjusting unit (13) which adjusts a vacuum pressure so that a pressure of a space within said vacuum chamber surrounding said imprint mold and said substrate becomes a pressure P [Pa], wherein said forcing unit and said pressure adjusting unit are control based on a depth K [nm] of said concave part pattern of said imprint mold and a height k [nm] of said convex part pattern of said replica, wherein said forcing unit and said pressure adjusting unit are controlled to satisfy Mmin/P≧k/(K−k). |
| Claim: | 8. The imprint apparatus according to claim 7 , wherein said pressure adjusting unit is a decompression unit. |
| Claim: | 9. The imprint apparatus according to claim 7 , wherein said forcing unit and said pressure adjusting unit are controlled to satisfy 99≧Mmin/P≧9. |
| Claim: | 10. An imprint apparatus that forms a replica which has a convex part pattern corresponding to a concave part pattern, said imprint apparatus comprising: a vacuum chamber; a substrate provided within the vacuum chamber, the substrate providing a location for placing a transfer material; an imprint mold having a concave part pattern; a forcing unit which generates a forcing power to force said imprint mold against the transfer material located on said substrate at a minimum forcing pressure Mmin [Pa] at a contact area between said imprint mold (4) and said transfer material (2); a pressure adjusting unit (13) which adjusts a vacuum pressure so that a pressure of a space within said vacuum chamber surrounding said imprint mold and said substrate becomes a pressure P [Pa]; and a control unit, wherein said forcing unit and said pressure adjusting unit are controlled, by the control unit, based on a depth K [nm] of said concave part pattern of said imprint mold and a height k [nm] of said convex part pattern of said replica, wherein, with the height k [nm] of said convex part pattern less than the depth K, said forcing unit and said pressure adjusting unit are controlled to satisfy: 1.1 k /(K− 1.1 k)≧ M min/ P≧ 0.9 k /(K− 0.9 k). |
| Current U.S. Class: | 425/408 |
| Patent References Cited: | 2004/0131718 July 2004 Chou et al. 2006/0127522 June 2006 Chou 2-286316 November 1990 02286316 November 1990 2002-042387 February 2002 2003-67989 March 2003 2003-109254 April 2003 2003-173584 June 2003 1246688 January 2006 |
| Assistant Examiner: | Huda, Saeed M |
| Primary Examiner: | Nguyen, Khanh |
| Attorney, Agent or Firm: | Young & Thompson |
| Accession Number: | edspgr.07857611 |
| Database: | USPTO Patent Grants |
| Language: | English |
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