Bibliographic Details
| Title: |
METHOD FOR PRODUCING IMPRINT MOLD AND MAGNETIC RECORDING MEDIUM |
| Document Number: |
20110259849 |
| Publication Date: |
October 27, 2011 |
| Appl. No: |
13/093507 |
| Application Filed: |
April 25, 2011 |
| Abstract: |
According to one embodiment, a method for producing an imprint mold includes forming, on a substrate, a plurality of guides including a first wall surface and a second wall surface, wherein an angle between at least one of the first and second wall surfaces and an exposed substrate surface is 131° or less, applying a self-assembling material, which forms a sphere when phase-separated, to a guide groove area defined by the first wall surface, the second wall surface and the substrate surface, and self-assembling the self-assembling material to form a dot pattern, etching the substrate by using the dot pattern as a mask to transfer the dot pattern and forming an imprint mold by using the substrate with the dot pattern transferred as a master mold. |
| Inventors: |
Sakurai, Masatoshi (Tokyo, JP); Kihara, Naoko (Kawasaki-shi, JP); Tanaka, Hiroki (Onojo-shi, JP); Yamamoto, Ryosuke (Kawasaki-shi, JP); Yuzawa, Akiko (Yokohama-shi, JP) |
| Assignees: |
Kabushiki Kaisha Toshiba (Tokyo, JP) |
| Claim: |
1. A method for producing an imprint mold, comprising: forming, on a substrate, a plurality of guides comprising a first wall surface and a second wall surface, wherein an angle between at least one of the first and second wall surfaces and an exposed substrate surface is 131° or less; applying a self-assembling material, which forms a sphere when phase-separated, to a guide groove area defined by the first wall surface, the second wall surface and the substrate surface, and self-assembling the self-assembling material to form a dot pattern; etching the substrate by using the dot pattern as a mask to transfer the dot pattern; and forming an imprint mold by using the substrate with the dot pattern transferred as a master mold. |
| Claim: |
2. The method of claim 1, wherein the angle is 120° or more and 131° or less. |
| Claim: |
3. The method of claim 1, wherein the angle between the first wall surface and the substrate is approximately the same as the angle between the second wall surface and the substrate. |
| Claim: |
4. The method of claim 1, wherein one of the angle between the first wall surface and the substrate and the angle between the second wall surface and the substrate is 90° or more and less than 120°. |
| Claim: |
5. The method of claim 1, wherein the self-assembling material is a polystyrene-polydimethylsiloxane diblock copolymer. |
| Claim: |
6. A method for producing a magnetic recording medium, comprising: forming a resist on a magnetic recording layer; imprinting the resist with an imprint mold produced by the method of claim 1 to transfer the dot pattern; removing a residue remaining in a recess of the patterned resist; and etching the magnetic recording layer by using the patterned resist as a mask to transfer the dot pattern. |
| Current U.S. Class: |
216/22 |
| Current International Class: |
29; 44 |
| Accession Number: |
edspap.20110259849 |
| Database: |
USPTO Patent Applications |
