Effect of target power ratio on microstructure and deposition rate of TiN film deposited by dual pulse power magnetron sputtering
| Title: | Effect of target power ratio on microstructure and deposition rate of TiN film deposited by dual pulse power magnetron sputtering |
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| Authors: | Yang, Chao, Wang, Rong, Jiang, Bailing, Hao, Juan |
| Source: | In Ceramics International 15 October 2022 48(20):29652-29658 |
| Database: | ScienceDirect |
| ISSN: | 02728842 |
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| DOI: | 10.1016/j.ceramint.2022.06.220 |
| Published in: | Ceramics International |
| Language: | English |