Industrially Applicable Read Disturb Model and Performance on Mega-Bit 28nm Embedded RRAM

Bibliographic Details
Title: Industrially Applicable Read Disturb Model and Performance on Mega-Bit 28nm Embedded RRAM
Authors: Yang, Chang-Feng, Wu, Chun-Yu, Yang, Ming-Han, Wang, Wayne, Yang, Ming-Ta, Chien, Ta-Chun, Fan, Vincent, Tsai, Shih-Chi, Lee, Yung-Huei, Chu, Wen-Ting, Hung, Arthur
Source: 2020 IEEE Symposium on VLSI Technology VLSI Technology, 2020 IEEE Symposium on. :1-2 Jun, 2020
Relation: 2020 IEEE Symposium on VLSI Technology
Database: IEEE Xplore Digital Library
More Details
ISBN:9781728164601
ISSN:21589682
DOI:10.1109/VLSITechnology18217.2020.9265060
Published in:2020 IEEE Symposium on VLSI Technology, VLSI Technology, 2020 IEEE Symposium on