Comparative Study of High-k Dielectric on MoS2 Deposited by Plasma Enhanced ALD
| Title: | Comparative Study of High-k Dielectric on MoS2 Deposited by Plasma Enhanced ALD |
|---|---|
| Authors: | Chang, Wen Hsin, Okada, Naoya, Asai, Hidehiro, Fukuda, Koichi, Okada, Mitsuhiro, Endo, Takahiko, Miyata, Yasumitsu, Irisawa, Toshifumi |
| Source: | 2019 Silicon Nanoelectronics Workshop (SNW) Silicon Nanoelectronics Workshop (SNW), 2019. :1-2 Jun, 2019 |
| Relation: | 2019 Silicon Nanoelectronics Workshop (SNW) |
| Database: | IEEE Xplore Digital Library |
| ISBN: | 9784863487024 9784863487017 |
|---|---|
| ISSN: | 21614644 |
| DOI: | 10.23919/SNW.2019.8782902 |
| Published in: | 2019 Silicon Nanoelectronics Workshop (SNW), Silicon Nanoelectronics Workshop (SNW), 2019 |