Forming a more robust sidewall spacer with lower k (dielectric constant) value

Bibliographic Details
Title: Forming a more robust sidewall spacer with lower k (dielectric constant) value
Authors: Tao Han, Man Gu, Grunow, Stephan, Huang Liu, Sankaran, Sujatha, Jinping Liu
Source: 2017 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2017 China. :1-3 Mar, 2017
Relation: 2017 China Semiconductor Technology International Conference (CSTIC)
Database: IEEE Xplore Digital Library