High temperature ion implanter for SiC and Si devices

Bibliographic Details
Title: High temperature ion implanter for SiC and Si devices
Authors: Takahashi, Naoya, Itoi, Suguru, Nakashima, Yoshiki, Zhao, WeiJiang, Onoda, Hiroshi, Sakai, Shigeki
Source: 2015 15th International Workshop on Junction Technology (IWJT) Junction Technology (IWJT), 2015 15th International Workshop on. :6-7 Jun, 2015
Relation: 2015 15th International Workshop on Junction Technology (IWJT)
Database: IEEE Xplore Digital Library