Sub-quarter Micron Poly-Si Etching With Positive Pulse Biasing Technique
| Title: | Sub-quarter Micron Poly-Si Etching With Positive Pulse Biasing Technique |
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| Authors: | Kofuji, N., Tsujimoto, K., Mizutani, T. |
| Source: | Proceedings of 1st International Symposium on Plasma Process-Induced Damage Plasma Process-Induced Damage, 1996 1st International Symposium on. :234-236 1996 |
| Relation: | 1st International Symposium on Plasma Process-Induced Damage |
| Database: | IEEE Xplore Digital Library |
| ISBN: | 0965157709 9780965157704 |
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| DOI: | 10.1109/PPID.1996.715246 |
| Published in: | Proceedings of 1st International Symposium on Plasma Process-Induced Damage, Plasma Process-Induced Damage, 1996 1st International Symposium on |