High aspect ratio TSV etching process for high-capacitor

Bibliographic Details
Title: High aspect ratio TSV etching process for high-capacitor
Authors: Murayama, Takahide, Sakuishi, Toshiyuki, Morikawa, Yasuhiro, Tani, Noriaki, Saitou, Kazuya
Source: IEEE CPMT Symposium Japan 2014 CPMT Symposium Japan (ICSJ), 2014 IEEE. :150-153 Nov, 2014
Relation: 2014 IEEE CPMT Symposium Japan (ICSJ)
Database: IEEE Xplore Digital Library
More Details
ISBN:9781479961948
9781479961931
9781479961955
ISSN:23735449
DOI:10.1109/ICSJ.2014.7009632
Published in:IEEE CPMT Symposium Japan 2014, CPMT Symposium Japan (ICSJ), 2014 IEEE