Strain and layout management in dual channel (sSOI substrate, SiGe channel) planar FDSOI MOSFETs
Title: | Strain and layout management in dual channel (sSOI substrate, SiGe channel) planar FDSOI MOSFETs |
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Authors: | Andrieu, F., Casse, M., Baylac, E., Perreau, P., Nier, O., Rideau, D., Berthelon, R., Pourchon, F., Pofelski, A., De Salvo, B., Gallon, C., Mazzocchi, V., Barge, D., Gaumer, C., Gourhant, O., Cros, A., Barral, V., Ranica, R., Planes, N., Schwarzenbach, W., Richard, E., Josse, E., Weber, O., Arnaud, F., Vinet, M., Faynot, O., Haond, M. |
Source: | 2014 44th European Solid State Device Research Conference (ESSDERC) Solid State Device Research Conference (ESSDERC), 2014 44th European. :106-109 Sep, 2014 |
Relation: | ESSDERC 2014 - 44th European Solid State Device Research Conference |
Database: | IEEE Xplore Digital Library |
ISBN: | 9781479943784 9781479943760 |
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ISSN: | 19308876 23786558 |
DOI: | 10.1109/ESSDERC.2014.6948769 |
Published in: | 2014 44th European Solid State Device Research Conference (ESSDERC), Solid State Device Research Conference (ESSDERC), 2014 44th European |