Strain and layout management in dual channel (sSOI substrate, SiGe channel) planar FDSOI MOSFETs

Bibliographic Details
Title: Strain and layout management in dual channel (sSOI substrate, SiGe channel) planar FDSOI MOSFETs
Authors: Andrieu, F., Casse, M., Baylac, E., Perreau, P., Nier, O., Rideau, D., Berthelon, R., Pourchon, F., Pofelski, A., De Salvo, B., Gallon, C., Mazzocchi, V., Barge, D., Gaumer, C., Gourhant, O., Cros, A., Barral, V., Ranica, R., Planes, N., Schwarzenbach, W., Richard, E., Josse, E., Weber, O., Arnaud, F., Vinet, M., Faynot, O., Haond, M.
Source: 2014 44th European Solid State Device Research Conference (ESSDERC) Solid State Device Research Conference (ESSDERC), 2014 44th European. :106-109 Sep, 2014
Relation: ESSDERC 2014 - 44th European Solid State Device Research Conference
Database: IEEE Xplore Digital Library