A Comparative Study of NBTI and RTN Amplitude Distributions in High- $\kappa$ Gate Dielectric pMOSFETs
| Title: | A Comparative Study of NBTI and RTN Amplitude Distributions in High- $\kappa$ Gate Dielectric pMOSFETs |
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| Authors: | Chiu, J. P., Chung, Y. T., Wang, T., Chen, M.-C., Lu, C. Y., Yu, K. F. |
| Source: | IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 33(2):176-178 Feb, 2012 |
| Database: | IEEE Xplore Digital Library |
| ISSN: | 07413106 15580563 |
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| DOI: | 10.1109/LED.2011.2176912 |
| Published in: | IEEE Electron Device Letters, Electron Device Letters, IEEE, IEEE Electron Device Lett. |