An Extreme Surface Proximity Push for Embedded SiGe in pMOSFETs Featuring Self-Aligned Silicon Reflow

Bibliographic Details
Title: An Extreme Surface Proximity Push for Embedded SiGe in pMOSFETs Featuring Self-Aligned Silicon Reflow
Authors: Lin, D.-W., Chen, C.-L., Chen, M.-J., Wu, C.-C.
Source: IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 31(9):924-926 Sep, 2010
Database: IEEE Xplore Digital Library