CMOS compatible Ge/Si core/shell nanowire gate-all-around pMOSFET integrated with HfO2/TaN gate stack

Bibliographic Details
Title: CMOS compatible Ge/Si core/shell nanowire gate-all-around pMOSFET integrated with HfO2/TaN gate stack
Authors: Peng, J. W., Singh, N., Lo, G. Q., Kwong, D.L., Lee, S. J.
Source: 2009 IEEE International Electron Devices Meeting (IEDM) Electron Devices Meeting (IEDM), 2009 IEEE International. :1-4 Dec, 2009
Relation: 2009 IEEE International Electron Devices Meeting (IEDM)
Database: IEEE Xplore Digital Library
More Details
ISBN:9781424456406
9781424456390
9781424456413
ISSN:01631918
2156017X
DOI:10.1109/IEDM.2009.5424284
Published in:2009 IEEE International Electron Devices Meeting (IEDM), Electron Devices Meeting (IEDM), 2009 IEEE International