High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography
| Title: | High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography |
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| Authors: | Kahraman Keskinbora, Umut Tunca Sanli, Margarita Baluktsian, Corinne Grévent, Markus Weigand, Gisela Schütz |
| Source: | Beilstein Journal of Nanotechnology, Vol 9, Iss 1, Pp 2049-2056 (2018) |
| Publisher Information: | Beilstein-Institut, 2018. |
| Publication Year: | 2018 |
| Collection: | LCC:Technology LCC:Chemical technology LCC:Science LCC:Physics |
| Subject Terms: | extreme ultraviolet (EUV) radiation, focused ion beam (FIB), Fresnel zone plate, ion beam lithography (IBL), nanopatterning, soft X-rays, Technology, Chemical technology, TP1-1185, Science, Physics, QC1-999 |
| More Details: | Fresnel zone plates (FZP) are diffractive photonic devices used for high-resolution imaging and lithography at short wavelengths. Their fabrication requires nano-machining capabilities with exceptional precision and strict tolerances such as those enabled by modern lithography methods. In particular, ion beam lithography (IBL) is a noteworthy method thanks to its robust direct writing/milling capability. IBL allows for rapid prototyping of high-resolution FZPs that can be used for high-resolution imaging at soft X-ray energies. Here, we discuss improvements in the process enabling us to write zones down to 15 nm in width, achieving an effective outermost zone width of 30 nm. With a 35% reduction in process time and an increase in resolution by 26% compared to our previous results, we were able to resolve 21 nm features of a test sample using the FZP. The new process conditions are then applied for fabrication of large arrays of high-resolution zone plates. Results show that relatively large areas can be decorated with nanostructured devices via IBL by using multipurpose SEM/FIB instruments with potential applications in FEL focusing, extreme UV and soft X-ray lithography and as wavefront sensing devices for beam diagnostics. |
| Document Type: | article |
| File Description: | electronic resource |
| Language: | English |
| ISSN: | 2190-4286 |
| Relation: | https://doaj.org/toc/2190-4286 |
| DOI: | 10.3762/bjnano.9.194 |
| Access URL: | https://doaj.org/article/f78474e2de2649be9d1395549fc53b75 |
| Accession Number: | edsdoj.f78474e2de2649be9d1395549fc53b75 |
| Database: | Directory of Open Access Journals |
| ISSN: | 21904286 |
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| DOI: | 10.3762/bjnano.9.194 |
| Published in: | Beilstein Journal of Nanotechnology |
| Language: | English |