The Influence of Different Partial Pressure on the Fabrication of InGaO Ultraviolet Photodetectors

Bibliographic Details
Title: The Influence of Different Partial Pressure on the Fabrication of InGaO Ultraviolet Photodetectors
Authors: Sheng-Po Chang, Li-Yang Chang, Jyun-Yi Li
Source: Sensors, Vol 16, Iss 12, p 2145 (2016)
Publisher Information: MDPI AG, 2016.
Publication Year: 2016
Collection: LCC:Chemical technology
Subject Terms: InGaO, photodetector, oxygen partial pressure, Chemical technology, TP1-1185
More Details: A metal–semiconductor–metal ultraviolet photodetector has been fabricated with a radiofrequency (RF)-sputtered InGaO thin film. Results for the devices fabricated under different oxygen partial pressure are here in discussed. Under low oxygen partial pressure, the devices work in the photoconductive mode because of the large number of subgap states. Therefore, the devices exhibit internal gain. These defects in the films result in slow switching times and lower photo/dark current ratios. A higher flow ratio of oxygen during the sputtering process can effectively restrain the oxygen vacancies in the film. The responsivity of the photodetector fabricated under an oxygen flow ratio of 20% can reach 0.31 A/W. The rise time and decay time can reach 21 s and 27 s, respectively.
Document Type: article
File Description: electronic resource
Language: English
ISSN: 1424-8220
Relation: http://www.mdpi.com/1424-8220/16/12/2145; https://doaj.org/toc/1424-8220
DOI: 10.3390/s16122145
Access URL: https://doaj.org/article/b17c0ac57b844111bbe74f3d8fad8703
Accession Number: edsdoj.b17c0ac57b844111bbe74f3d8fad8703
Database: Directory of Open Access Journals
More Details
ISSN:14248220
DOI:10.3390/s16122145
Published in:Sensors
Language:English