Deformation Mechanism of Depositing Amorphous Cu-Ta Alloy Film via Nanoindentation Test

Bibliographic Details
Title: Deformation Mechanism of Depositing Amorphous Cu-Ta Alloy Film via Nanoindentation Test
Authors: Weibing Li, Xiao Wang, Xiaobin Feng, Yao Du, Xu Zhang, Yong Xie, Xiaoming Chen, Yang Lu, Weidong Wang
Source: Nanomaterials, Vol 12, Iss 6, p 1022 (2022)
Publisher Information: MDPI AG, 2022.
Publication Year: 2022
Collection: LCC:Chemistry
Subject Terms: Cu-Ta alloy, deform mechanism, magnetron sputtering, nanoindentation, molecular dynamics (MD), Chemistry, QD1-999
More Details: As a representative of immiscible alloy systems, the Cu-Ta system was the research topic because of its potential application in industry, military and defense fields. In this study, an amorphous Cu-Ta alloy film was manufactured through magnetron sputter deposition, which was characterized by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). Mechanical properties of Cu-Ta film were detected by the nanoindentation method, which show that the elastic modulus of Cu3.5Ta96.5 is 156.7 GPa, and the hardness is 14.4 GPa. The nanoindentation process was also simulated by molecular dynamic simulation to indicate the deformation mechanism during the load-unload stage. The simulation results show that the structure and Voronoi cells decreased by 0.1% at 50 Ps and then remained at this value during the nanoindentation process. In addition, the number of dislocations vary rapidly with the depth between indenter and surface. Based on the experimental and simulation results, the Voronoi structural changes and dislocation motions are the key reasons for the crystallization of amorphous alloys when loads are applied.
Document Type: article
File Description: electronic resource
Language: English
ISSN: 2079-4991
Relation: https://www.mdpi.com/2079-4991/12/6/1022; https://doaj.org/toc/2079-4991
DOI: 10.3390/nano12061022
Access URL: https://doaj.org/article/d9f8b0c5ac6d4933a5e617aa82e3901c
Accession Number: edsdoj.9f8b0c5ac6d4933a5e617aa82e3901c
Database: Directory of Open Access Journals
More Details
ISSN:20794991
DOI:10.3390/nano12061022
Published in:Nanomaterials
Language:English