High performance and transparent multilayer MoS2 transistors: Tuning Schottky barrier characteristics

Bibliographic Details
Title: High performance and transparent multilayer MoS2 transistors: Tuning Schottky barrier characteristics
Authors: Young Ki Hong, Geonwook Yoo, Junyeon Kwon, Seongin Hong, Won Geun Song, Na Liu, Inturu Omkaram, Byungwook Yoo, Sanghyun Ju, Sunkook Kim, Min Suk Oh
Source: AIP Advances, Vol 6, Iss 5, Pp 055026-055026-6 (2016)
Publisher Information: AIP Publishing LLC, 2016.
Publication Year: 2016
Collection: LCC:Physics
Subject Terms: Physics, QC1-999
More Details: Various strategies and mechanisms have been suggested for investigating a Schottky contact behavior in molybdenum disulfide (MoS2) thin-film transistor (TFT), which are still in much debate and controversy. As one of promising breakthrough for transparent electronics with a high device performance, we have realized MoS2 TFTs with source/drain electrodes consisting of transparent bi-layers of a conducting oxide over a thin film of low work function metal. Intercalation of a low work function metal layer, such as aluminum, between MoS2 and transparent source/drain electrodes makes it possible to optimize the Schottky contact characteristics, resulting in about 24-fold and 3 orders of magnitude enhancement of the field-effect mobility and on-off current ratio, respectively, as well as transmittance of 87.4 % in the visible wavelength range.
Document Type: article
File Description: electronic resource
Language: English
ISSN: 2158-3226
Relation: https://doaj.org/toc/2158-3226
DOI: 10.1063/1.4953062
Access URL: https://doaj.org/article/79df7228df6347128f3761c43726890a
Accession Number: edsdoj.79df7228df6347128f3761c43726890a
Database: Directory of Open Access Journals
More Details
ISSN:21583226
DOI:10.1063/1.4953062
Published in:AIP Advances
Language:English