Academic Journal
The relation between residual stress, interfacial structure and the joint property in the SiO2f/SiO2-Nb joints
| Title: | The relation between residual stress, interfacial structure and the joint property in the SiO2f/SiO2-Nb joints |
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| Authors: | Qiang Ma, Zhuo Ran Li, Lai Shan Yang, Jing Huang Lin, Jin Ba, Ze Yu Wang, Jun Lei Qi, Ji Cai Feng |
| Source: | Scientific Reports, Vol 7, Iss 1, Pp 1-11 (2017) |
| Publisher Information: | Nature Portfolio, 2017. |
| Publication Year: | 2017 |
| Collection: | LCC:Medicine LCC:Science |
| Subject Terms: | Medicine, Science |
| More Details: | Abstract In order to achieve a high-quality joint between SiO2f/SiO2 and metals, it is necessary to address the poor wettability of SiO2f/SiO2 and the high residual stress in SiO2f/SiO2-Nb joint. Here, we simultaneously realize good wettability and low residual stress in SiO2f/SiO2-Nb joint by combined method of HF etching treatment and Finite Element Analysis (FEA). After etching treatment, the wettability of E-SiO2f/SiO2 was improved, and the residual stress in the joint was decreased. In order to better control the quality of joints, efforts were made to understand the relationship between surface structure of E-SiO2f/SiO2 and residual stress in joint using FEA. Based on the direction of FEA results, a relationship between residual stress, surface structure and joint property in the brazed joints were investigated by experiments. As well the FEA and the brazing test results both realized the high-quality joint of E-SiO2f/SiO2-Nb and the shear strength of the joint reached 61.9 MPa. |
| Document Type: | article |
| File Description: | electronic resource |
| Language: | English |
| ISSN: | 2045-2322 |
| Relation: | https://doaj.org/toc/2045-2322 |
| DOI: | 10.1038/s41598-017-04531-w |
| Access URL: | https://doaj.org/article/55adc1259249481fa67b83e9e1879426 |
| Accession Number: | edsdoj.55adc1259249481fa67b83e9e1879426 |
| Database: | Directory of Open Access Journals |
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| ISSN: | 20452322 |
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| DOI: | 10.1038/s41598-017-04531-w |
| Published in: | Scientific Reports |
| Language: | English |