Bibliographic Details
| Title: |
Enhanced antireflective and laser damage resistance of refractive-index gradient SiO2 nanostructured films at 1064 nm |
| Authors: |
Wan Lili, Yang Jie, Liu Xiaoru, Zhu Jiayi, Xu Gang, Hao Chenchun, Chen Xuecheng, Xiong Zhengwei |
| Source: |
Polish Journal of Chemical Technology, Vol 26, Iss 2, Pp 25-30 (2024) |
| Publisher Information: |
Sciendo, 2024. |
| Publication Year: |
2024 |
| Collection: |
LCC:Chemistry |
| Subject Terms: |
sio2 nanostructured films, sol-gel procedure, refractive-index gradient, antireflective, laser damage resistance, Chemistry, QD1-999 |
| More Details: |
A facile sol-gel procedure was employed to create refractive-index gradient SiO2 antireflective (AR) films. A monolayer film, characterized by the porous crosslinking framework, was fabricated with a designed volume ratio mixture both with colloidal silica suspension and soluble organic polysiloxane. The upper layer for the bilayer film was a hexamethylisilazane (HMDS) modified colloidal silica suspension, leading to the film surface transfer to hydrophobic. The strategic design of nanostructures in the bottom and upper layers resulted in a refractive-index gradient SiO2 film with enhanced AR properties. The bilayer film demonstrated a transmittance of 99.5% at 1064 nm, accompanied by a notable reduction in reflectivity. Moreover, the laser-induced damage threshold of the bilayer film was increased by 30%, rising to as high as 24.7 J/cm2. The SiO2 nanostructured film both showed a refractive-index gradient structure with excellent AR properties and exhibited good laser damage resistance. |
| Document Type: |
article |
| File Description: |
electronic resource |
| Language: |
English |
| ISSN: |
1899-4741 |
| Relation: |
https://doaj.org/toc/1899-4741 |
| DOI: |
10.2478/pjct-2024-0014 |
| Access URL: |
https://doaj.org/article/1362ff7af14f42d18ef80a62c802622e |
| Accession Number: |
edsdoj.1362ff7af14f42d18ef80a62c802622e |
| Database: |
Directory of Open Access Journals |
