Academic Journal
Soft X-ray angle-resolved photoemission spectroscopy of heavily boron-doped superconducting diamond films
Title: | Soft X-ray angle-resolved photoemission spectroscopy of heavily boron-doped superconducting diamond films |
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Authors: | T. Yokoya, T. Nakamura, T. Matushita, T. Muro, H. Okazaki, M. Arita, K. Shimada, H. Namatame, M. Taniguchi, Y. Takano, M. Nagao, T. Takenouchi, H. Kawarada and T. Oguchi |
Source: | Science and Technology of Advanced Materials, Vol 7, Iss S1, p S12 (2006) |
Publisher Information: | Taylor & Francis Group, 2006. |
Publication Year: | 2006 |
Collection: | LCC:Materials of engineering and construction. Mechanics of materials LCC:Biotechnology |
Subject Terms: | Materials of engineering and construction. Mechanics of materials, TA401-492, Biotechnology, TP248.13-248.65 |
More Details: | We have performed soft X-ray angle-resolved photoemission spectroscopy (SXARPES) of microwave plasma-assisted chemical vapor deposition diamond films with different B concentrations in order to study the origin of the metallic behavior of superconducting diamond. SXARPES results clearly show valence band dispersions with a bandwidth of ~23 eV and with a top of the valence band at gamma point in the Brillouin zone, which are consistent with the calculated valence band dispersions of pure diamond. Boron concentration-dependent band dispersions near the Fermi level (EF) exhibit a systematic shift of EF, indicating depopulation of electrons due to hole doping. These SXARPES results indicate that diamond bands retain for heavy boron doping and holes in the diamond band are responsible for the metallic states leading to superconductivity at low temperature. A high-resolution photoemission spectroscopy spectrum near EF of a heavily boron-doped diamond superconductor is also presented. |
Document Type: | article |
File Description: | electronic resource |
Language: | English |
ISSN: | 1468-6996 1878-5514 |
Relation: | http://www.iop.org/EJ/abstract/-search=58672466.17/1468-6996/7/S1/A04; https://doaj.org/toc/1468-6996; https://doaj.org/toc/1878-5514 |
Access URL: | https://doaj.org/article/0312602091fe42758f3a2b60708c7c5c |
Accession Number: | edsdoj.0312602091fe42758f3a2b60708c7c5c |
Database: | Directory of Open Access Journals |
ISSN: | 14686996 18785514 |
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Published in: | Science and Technology of Advanced Materials |
Language: | English |