Bibliographic Details
| Title: |
Novel Mechanism-Based Descriptors for Extreme Ultraviolet-Induced Photoacid Generation: Key Factors Affecting Extreme Ultraviolet Sensitivity |
| Authors: |
Ji Young Park, Hyun-Ji Song, Thanh Cuong Nguyen, Won-Joon Son, Daekeon Kim, Giyoung Song, Suk-Koo Hong, Heeyoung Go, Changmin Park, Inkook Jang, Dae Sin Kim |
| Source: |
Molecules, Vol 28, Iss 17, p 6244 (2023) |
| Publisher Information: |
MDPI AG, 2023. |
| Publication Year: |
2023 |
| Collection: |
LCC:Organic chemistry |
| Subject Terms: |
photoacid generator (PAG), acid-generation mechanism, chemical amplified resist (CAR), triphenylsulfonium (TPS), extreme ultraviolet (EUV) photoresist, Organic chemistry, QD241-441 |
| More Details: |
Predicting photolithography performance in silico for a given materials combination is essential for developing better patterning processes. However, it is still an extremely daunting task because of the entangled chemistry with multiple reactions among many material components. Herein, we investigated the EUV-induced photochemical reaction mechanism of a model photoacid generator (PAG), triphenylsulfonium cation, using atomiC–Scale materials modeling to elucidate that the acid generation yield strongly depends on two main factors: the lowest unoccupied molecular orbital (LUMO) of PAG cation associated with the electron-trap efficiency ‘before C–S bond dissociation’ and the overall oxidation energy change of rearranged PAG associated with the proton-generation efficiency ‘after C–S bond dissociation’. Furthermore, by considering stepwise reactions accordingly, we developed a two-parameter-based prediction model predicting the exposure dose of the resist, which outperformed the traditional LUMO-based prediction model. Our model suggests that one should not focus only on the LUMO energies but also on the energy change during the rearrangement process of the activated triphenylsulfonium (TPS) species. We also believe that the model is well suited for computational materials screening and/or inverse design of novel PAG materials with high lithographic performances. |
| Document Type: |
article |
| File Description: |
electronic resource |
| Language: |
English |
| ISSN: |
1420-3049 |
| Relation: |
https://www.mdpi.com/1420-3049/28/17/6244; https://doaj.org/toc/1420-3049 |
| DOI: |
10.3390/molecules28176244 |
| Access URL: |
https://doaj.org/article/012c9efdd14c4b02a0ffc4e64d12605e |
| Accession Number: |
edsdoj.012c9efdd14c4b02a0ffc4e64d12605e |
| Database: |
Directory of Open Access Journals |
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