Bibliographic Details
| Title: |
New Approach for ArFi Extension by Dry Development Rinse Process |
| Authors: |
Shibayama, Wataru, Shigaki, Shuhei, Takeda, Satoshi, Onishi, Ryuji, Nakajima, Makoto, Sakamoto, Rikimaru |
| Source: |
Journal of photopolymer science and technology. 29(1):69-74 |
| Availability: |
http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN607174931&indx=1&recIds=ETOCRN607174931 |
| Database: |
British Library Document Supply Centre Inside Serials & Conference Proceedings |
