Nanoimprint Lithography and the Role of Viscoelasticity in the Generation of Residual Stress in Model Polystyrene Patterns

Bibliographic Details
Title: Nanoimprint Lithography and the Role of Viscoelasticity in the Generation of Residual Stress in Model Polystyrene Patterns
Authors: Ding, Y., Ro, H. W., Alvine, K. J., Okerberg, B. C., Zhou, J., Douglas, J. F., Karim, A., Soles, C. L.
Source: ADVANCED FUNCTIONAL MATERIALS. 18(12):1854-1862
Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN231960168&indx=1&recIds=ETOCRN231960168
Database: British Library Document Supply Centre Inside Serials & Conference Proceedings
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ISSN:1616301X
Published in:ADVANCED FUNCTIONAL MATERIALS
Language:English