Plasma and X-UV source characteristics for Al targets heated by 40 ns Nd-laser pulses

Bibliographic Details
Title: Plasma and X-UV source characteristics for Al targets heated by 40 ns Nd-laser pulses
Authors: Whitlock, R. R., Greig, J. R., Nagel, D. J., Topscher, S. J.
Source: JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY B MICROELECTRONICS AND NANOMETER STRUCTURE. 19(4):1241-1252
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