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Etch challenges for DSA implementation in CMOS via patterning [9054-15]

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Title: Etch challenges for DSA implementation in CMOS via patterning [9054-15]
Advanced etch technology for nanopatterning
Authors: Barros, P.P., Barnola, S., Gharbi, A., Argoud, M., Servin, I., Tiron, R., Chevalier, X., Navarro, C., Nicolet, C., Lapeyre, C.
Source: PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING. 9054:9054 0G-9054 0G
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  Data: Etch challenges for DSA implementation in CMOS via patterning [9054-15]<br />Advanced etch technology for nanopatterning
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      – Text: English
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        PageCount: 1
        StartPage: 9054 0G
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      – TitleFull: Etch challenges for DSA implementation in CMOS via patterning [9054-15]
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            NameFull: Servin, I.
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            NameFull: Lapeyre, C.
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            – D: 01
              M: 01
              Type: published
              Y: 2014
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              Value: 9054
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