Etch challenges for DSA implementation in CMOS via patterning [9054-15]

Bibliographic Details
Title: Etch challenges for DSA implementation in CMOS via patterning [9054-15]
Advanced etch technology for nanopatterning
Authors: Barros, P.P., Barnola, S., Gharbi, A., Argoud, M., Servin, I., Tiron, R., Chevalier, X., Navarro, C., Nicolet, C., Lapeyre, C.
Source: PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING. 9054:9054 0G-9054 0G
Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCCN087326860&indx=1&recIds=ETOCCN087326860
Database: British Library Document Supply Centre Inside Serials & Conference Proceedings
More Details
ISBN:9780819499776
0819499773
ISSN:0277786X
Published in:PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING
Language:English