Effects of high pressure thermal treatments in oxygen and helium atmospheres on amorphous silicon dioxide and its radiation hardness

Bibliographic Details
Title: Effects of high pressure thermal treatments in oxygen and helium atmospheres on amorphous silicon dioxide and its radiation hardness
SIO2, advanced dielectrics and related devices
Authors: Nuccio, L., Agnello, S., Boscaino, R., Brichard, B.
Source: JOURNAL OF NONCRYSTALLINE SOLIDS. 355(18/21):1046-1049
Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCCN073195390&indx=1&recIds=ETOCCN073195390
Database: British Library Document Supply Centre Inside Serials & Conference Proceedings
More Details
ISSN:00223093
Published in:JOURNAL OF NONCRYSTALLINE SOLIDS
Language:English