Influence of direct current plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper films
| Title: | Influence of direct current plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper films Proceedings from the European Material Research Society Spring meeting 2008-symposium B; Laser and plasma in micro- and nano-scale materials processing and diagnostics |
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| Authors: | Chan, K.-Y., Luo, P.-Q., Zhou, Z.-B., Tou, T.-Y., Teo, B.-S. |
| Source: | APPLIED SURFACE SCIENCE. 255(10):5186-5190 |
| Availability: | http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCCN072108897&indx=1&recIds=ETOCCN072108897 |
| Database: | British Library Document Supply Centre Inside Serials & Conference Proceedings |
| ISSN: | 01694332 |
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| Published in: | APPLIED SURFACE SCIENCE |
| Language: | English |