| Title: |
Influence of direct current plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper films
Proceedings from the European Material Research Society Spring meeting 2008-symposium B; Laser and plasma in micro- and nano-scale materials processing and diagnostics |
| Authors: |
Chan, K.-Y., Luo, P.-Q., Zhou, Z.-B., Tou, T.-Y., Teo, B.-S. |
| Source: |
APPLIED SURFACE SCIENCE. 255(10):5186-5190 |
| Availability: |
http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCCN072108897&indx=1&recIds=ETOCCN072108897 |
| Database: |
British Library Document Supply Centre Inside Serials & Conference Proceedings |
