Bibliographic Details
| Title: |
Copper Resistivity in Electrodeposited Dual Damascene Interconnects - An Integrated Circuit Perspective
Electrochemical Society |
| Authors: |
Lustig, N., Baker-O Neal, B., Flaitz, P., Standaert, T., DeHaven, P., Simon, A., Ko, T., Grunow, S., Werking, J., Greco, S. |
| Source: |
MEETING ABSTRACTS- ELECTROCHEMICAL SOCIETY -ALL DIVISIONS CD-ROM EDITION-. (1):411-411 |
| Availability: |
http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCCN061418968&indx=1&recIds=ETOCCN061418968 |
| Database: |
British Library Document Supply Centre Inside Serials & Conference Proceedings |
