Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness [5375-132]
| Title: | Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness [5375-132] Metrology, inspection and process control for microlithography |
|---|---|
| Authors: | Valley, J. F., Poduje, N., Sinha, J., Judell, N., Wu, J., Boonman, M., Tempelaars, S., van Dommelen, Y., Kattouw, H., Hauschild, J. |
| Source: | PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING. 5375(2):1098-1108 |
| Availability: | http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCCN053118882&indx=1&recIds=ETOCCN053118882 |
| Database: | British Library Document Supply Centre Inside Serials & Conference Proceedings |
| ISBN: | 9780819452887 0819452882 |
|---|---|
| ISSN: | 0277786X |
| Published in: | PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING |
| Language: | English |