Bibliographic Details
| Title: |
Sensitivity enhancement of chemically amplified resists and performance study using EUV interference lithography |
| Authors: |
Panning, Eric M., Goldberg, Kenneth A., Buitrago, Elizabeth, Nagahara, Seiji, Yildirim, Oktay, Nakagawa, Hisashi, Tagawa, Seiichi, Meeuwissen, Marieke, Nagai, Tomoki, Naruoka, Takehiko, Verspaget, Coen, Hoefnagels, Rik, Rispens, Gijsbert, Shiraishi, Gosuke, Terashita, Yuichi, Minekawa, Yukie, Yoshihara, Kosuke, Oshima, Akihiro, Vockenhuber, Michaela, Ekinci, Yasin |
| Source: |
Proceedings of SPIE; March 2016, Vol. 9776 Issue: 1 p97760Z-97760Z-15, 9678256p |
| Database: |
Supplemental Index |
