Novel high sensitivity EUV photoresist for sub-7nm node

Bibliographic Details
Title: Novel high sensitivity EUV photoresist for sub-7nm node
Authors: Hohle, Christoph K., Younkin, Todd R., Nagai, Tomoki, Nakagawa, Hisashi, Naruoka, Takehiko, Tagawa, Seiichi, Oshima, Akihiro, Nagahara, Seiji, Shiraishi, Gosuke, Yoshihara, Kosuke, Terashita, Yuichi, Minekawa, Yukie, Buitrago, Elizabeth, Ekinci, Yasin, Yildirim, Oktay, Meeuwissen, Marieke, Hoefnagels, Rik, Rispens, Gijsbert, Verspaget, Coen, Maas, Raymond
Source: Proceedings of SPIE; March 2016, Vol. 9779 Issue: 1 p977908-977908-7
Database: Supplemental Index
More Details
ISSN:0277786X
DOI:10.1117/12.2218936
Published in:Proceedings of SPIE
Language:English