Assessment of silicon carbide x-ray mask overlay performance in the IBM Advanced Lithography Facility x-ray stepper.

Bibliographic Details
Title: Assessment of silicon carbide x-ray mask overlay performance in the IBM Advanced Lithography Facility x-ray stepper.
Authors: Kimmel, Kurt R., Chen, Alek C., Powers, Lynn A., Vampatella, Ben R.
Source: Proceedings of SPIE; Nov1995, Issue 1, p383-390, 8p
Database: Complementary Index
More Details
ISSN:0277786X
DOI:10.1117/12.209176
Published in:Proceedings of SPIE
Language:English