Assessment of silicon carbide x-ray mask overlay performance in the IBM Advanced Lithography Facility x-ray stepper.
Title: | Assessment of silicon carbide x-ray mask overlay performance in the IBM Advanced Lithography Facility x-ray stepper. |
---|---|
Authors: | Kimmel, Kurt R., Chen, Alek C., Powers, Lynn A., Vampatella, Ben R. |
Source: | Proceedings of SPIE; Nov1995, Issue 1, p383-390, 8p |
Database: | Complementary Index |
ISSN: | 0277786X |
---|---|
DOI: | 10.1117/12.209176 |
Published in: | Proceedings of SPIE |
Language: | English |