Performance of immersion lithography for 45-nm-node CMOS and ultra-high density SRAM with 0.25um2.
| Title: | Performance of immersion lithography for 45-nm-node CMOS and ultra-high density SRAM with 0.25um2. |
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| Authors: | Mimotogi, Shoji, Uesawa, Fumikatsu, Tominaga, Makoto, Fujise, Hiroharu, Sho, Koutaro, Katsumata, Mikio, Hane, Hiroki, Ikegami, Atsushi, Nagahara, Seiji, Ema, Tatsuhiko, Asano, Masafumi, Kanai, Hideki, Kimura, Taiki, Iwai, Masaaki |
| Source: | Proceedings of SPIE; Nov2007, Issue 1, p652008-652008-9, 9p |
| Database: | Complementary Index |
| ISSN: | 0277786X |
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| DOI: | 10.1117/12.711049 |
| Published in: | Proceedings of SPIE |
| Language: | English |