| Title: |
Investigation of vacuum measurement by nano‐gap device. |
| Authors: |
Komiya, Kazuki1,2 (AUTHOR) komiya.kazuki@iri-tokyo.jp, Nagata, Koki1 (AUTHOR), Yamaoka, Hidehiko1 (AUTHOR), Date, Shuichi1 (AUTHOR), Miyashita, Yuito1 (AUTHOR), Yan, Min2 (AUTHOR) |
| Source: |
Electronics & Communications in Japan. Mar2024, Vol. 107 Issue 1, p1-5. 5p. |
| Subject Terms: |
Electron beam lithography, Electric fields, Microfabrication |
| Abstract: |
Advances in microfabrication technology have enabled electron beam lithography (EB lithography) systems to produce microfabrication on the order of 10 of nanometers. Using this technology, we have fabricated nanogap electrodes that can generate large electric fields at low voltages. The gap between the tips of the fabricated electrodes is 100 nm, and the curvature of each tip is 50 nm. The device was confirmed to work as an electronic vacuum gauge, the device successfully measured vacuum from 10−3 to 1 Pa at the electrode voltage of 3 V. [ABSTRACT FROM AUTHOR] |
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| Database: |
Business Source Complete |
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