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Simulation of the step coverage for chemical vapor deposited silicon dioxide.

Bibliographic Details
Title: Simulation of the step coverage for chemical vapor deposited silicon dioxide.
Authors: Wille, H., Burte, E., Ryssel, H.
Source: Journal of Applied Physics; April 1 1992, Vol. 71, p3532-3537, 6p
Database: Applied Science & Technology Source
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PubType: Academic Journal
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  Data: Simulation of the step coverage for chemical vapor deposited silicon dioxide.
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      – Type: doi
        Value: 10.1063/1.350908
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      – Code: eng
        Text: English
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      Pagination:
        PageCount: 6
        StartPage: 3532
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      – TitleFull: Simulation of the step coverage for chemical vapor deposited silicon dioxide.
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            NameFull: Wille, H.
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            NameFull: Burte, E.
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            NameFull: Ryssel, H.
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            – D: 01
              M: 04
              Text: April 1 1992
              Type: published
              Y: 1992
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              Value: 71
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            – TitleFull: Journal of Applied Physics
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