Simulation of the step coverage for chemical vapor deposited silicon dioxide.
| Title: | Simulation of the step coverage for chemical vapor deposited silicon dioxide. |
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| Authors: | Wille, H., Burte, E., Ryssel, H. |
| Source: | Journal of Applied Physics; April 1 1992, Vol. 71, p3532-3537, 6p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.350908 |
| Published in: | Journal of Applied Physics |
| Language: | English |