Microfocus x-ray study of selective area epitaxy of SiGe on Si.
| Title: | Microfocus x-ray study of selective area epitaxy of SiGe on Si. |
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| Authors: | Giannakopoulos, K. P., Roth, S., Burghammer, M. |
| Source: | Journal of Applied Physics; January 1 2003, Vol. 93 Issue 1, p259-264, 6p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.1527214 |
| Published in: | Journal of Applied Physics |
| Language: | English |