Characterizing resists and films with VUV spectroscopic ellipsometry.
Title: | Characterizing resists and films with VUV spectroscopic ellipsometry. |
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Authors: | Boher, Pierre, Evrard, Patrick, Piel, Jean Philippe |
Source: | Solid State Technology; July 2001, Vol. 44 Issue 7, p165-175, 11p |
Database: | Applied Science & Technology Source |
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RecordInfo | BibRecord: BibEntity: Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 11 StartPage: 165 Titles: – TitleFull: Characterizing resists and films with VUV spectroscopic ellipsometry. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Boher, Pierre – PersonEntity: Name: NameFull: Evrard, Patrick – PersonEntity: Name: NameFull: Piel, Jean Philippe IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 07 Text: July 2001 Type: published Y: 2001 Identifiers: – Type: issn-print Value: 0038111X Numbering: – Type: volume Value: 44 – Type: issue Value: 7 Titles: – TitleFull: Solid State Technology Type: main |
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