Micro-Raman characterization of crystallinity of laser-recrystallized silicon films on SiO2 insulators.
| Title: | Micro-Raman characterization of crystallinity of laser-recrystallized silicon films on SiO2 insulators. |
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| Authors: | Mizoguchi, K., Nakashima, S., Sugiura, Y. |
| Source: | Journal of Applied Physics; May 1 1999, Vol. 85 Issue 9, p6758-6762, 5p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.370190 |
| Published in: | Journal of Applied Physics |
| Language: | English |