Line wiggling due to plasma-induced film stress and prevention by surface roughness modification.

Bibliographic Details
Title:	Line wiggling due to plasma-induced film stress and prevention by surface roughness modification.
Authors:	Turnquist, Amelia¹, amelia.turnquist@hitachi-hightech.com, Kofuji, Naoyuki², Sebastian, Joseph¹, Kou, Hiroshi³, Arai, Takahiro³, Fukuda, Hideaki³, Tomczak, Yoann⁴, Sun, Yiting⁴, Piumi, Daniele⁴, Roest, David De⁴
Source:	Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Jan2025, Vol. 43 Issue 1, p1-12, 12p
Database:	Applied Science & Technology Source

More Details
ISSN:	21662746
DOI:	10.1116/6.0004116
Published in:	Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics
Language:	English