On the use of pulsed DC bias for etching high aspect ratio features.
| Title: | On the use of pulsed DC bias for etching high aspect ratio features. |
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| Authors: | Shi, Xingyi1, Xingyi_Shi@amat.com, Sadighi, Samaneh1, Rauf, Shahid1, Luo, Han1, Wang, Jun-Chieh1, Kenney, Jason1, Booth, Jean-Paul2, Marinov, Daniil2, Foucher, Mickaël2, Sirse, Nishant3 |
| Source: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Jan/Feb2025, Vol. 43 Issue 1, p1-13, 13p |
| Database: | Applied Science & Technology Source |
| ISSN: | 07342101 |
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| DOI: | 10.1116/6.0003943 |
| Published in: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films |
| Language: | English |