Effects of silicon on the growth and genetic stability of passion fruit.

Bibliographic Details
Title: Effects of silicon on the growth and genetic stability of passion fruit.
Alternate Title: Silício no crescimento e estabilidade genética de plantas de maracujazeiro.
Authors: Souza Costa, Bárbara Nogueira1 babinogueiraagro@hotmail.com, de Maria Gomes Dias, Gabrielen1, de Jesus Silva Costa, Irton1, de Assis, Franscinely Aparecida1, da Silveira, Flávia Aparecida1, Pasqual, Moacir2
Source: Acta Scientiarum: Agronomy. Oct-Dec2016, Vol. 38 Issue 4, p503-511. 9p.
Subject Terms: *PASSION fruit, *SILICON research, *FRUIT growing, *FLOW cytometry, *GENETIC testing
Abstract (English): The objective of this study was to determine the silicon concentration that would provide good growth in passion fruit plants. Passion fruit seeds were sown in polystyrene. After 60 days, when they were approximately 15 cm tall, the plants were transplanted into polyethylene pots containing 1.1 kg Tropstrato® substrate. Treatments consisted of four concentrations (0, 0.28, 0.55, and 0.83 g pot-1) of silicon applied as a silicic acid solution 1%. This solution was applied around the stem of the plants (drenched), with the first application being administered 15 days after transplanting. In total, three applications were made at intervals of 15 days. After the last application, the plants were subjected to chemical analysis to determine the silicon concentration and to X-ray microanalysis and flow cytometry. Phytotechnical analyses were performed during the applications. The use of silicon in concentrations of 0.28 and 0.55 g pot-1 provides better growth of the passion fruit, and the absorption and deposition of the silicon in the passion fruit leaves are proportional to the availability of this element in the plant. The roots of the passion fruit plant are silicon accumulators, and the DNA stability and amount are preserved in the silicon-treated passion fruit plants. [ABSTRACT FROM AUTHOR]
Abstract (Portuguese): O objetivo foi determinar uma concentração de silício que proporcionasse um bom crescimento de plantas de maracujá. Sementes de maracujazeiro foram semeadas em bandejas de poliestireno, após 60 dias, as plantas com aproximadamente 15 cm de altura, foram transplantadas para vasos de polietileno contendo 1,1 kg de substrato Tropstrato®. Os tratamentos consistiram de quatro concentrações (0; 0,28; 0,55 e 0,83 g vaso-1) de silício, na forma de solução de ácido silícico a 1%. Esta solução foi aplicada ao redor do caule das plantas (drench), sendo a primeira aplicação realizada 15 dias após o transplantio das plantas. No total, foram realizadas três aplicações, em intervalos de 15 dias. Após a última aplicação, as plantas foram submetidas à análise química de concentração de silício, microanálise de raios-X e citometria de fluxo. As análises fitotécnicas foram realizadas no decorrer das aplicações. O uso do silício nas concentrações 0,28 e 0,55 g vaso-1, proporciona melhor crescimento das plantas de maracujazeiro, a absorção de silício e sua deposição nas folhas de maracujazeiro são proporcionais à disponibilidade desse elemento para a planta, o maracujazeiro é uma planta acumuladora de silício nas raízes e a estabilidade da quantidade de DNA é preservada nas plantas de maracujazeiro tratadas com silício. [ABSTRACT FROM AUTHOR]
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Database: Academic Search Complete
More Details
ISSN:16799275
DOI:10.4025/actasciagron.v38i4.30939
Published in:Acta Scientiarum: Agronomy
Language:English