APA (7th ed.) Citation

Datta, S., Xu, Y., Mahan, A. H., Branz, H. M., & Cohen, J. D. (2006). Superior structural and electronic properties for amorphous silicon–germanium alloys deposited by a low temperature hot wire chemical vapor deposition process. JOURNAL OF NONCRYSTALLINE SOLIDS, 352(NO 9/20), 1250-1254.

Chicago Style (17th ed.) Citation

Datta, S., Y. Xu, A. H. Mahan, H. M. Branz, and J. D. Cohen. "Superior Structural and Electronic Properties for Amorphous Silicon–germanium Alloys Deposited by a Low Temperature Hot Wire Chemical Vapor Deposition Process." JOURNAL OF NONCRYSTALLINE SOLIDS 352, no. NO 9/20 (2006): 1250-1254.

MLA (8th ed.) Citation

Datta, S., et al. "Superior Structural and Electronic Properties for Amorphous Silicon–germanium Alloys Deposited by a Low Temperature Hot Wire Chemical Vapor Deposition Process." JOURNAL OF NONCRYSTALLINE SOLIDS, vol. 352, no. NO 9/20, 2006, pp. 1250-1254.

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